Aktuelle Veranstaltungen

Entegris Technology Day

Chemical Mechanical Planarization and Wet Etch & Clean

By 2030, 50% of the car costs are expected to be SC components related. While it is an exciting source of growth for the complete supply chain, the car industry sets a great challenge for all of us: reaching the ppb level in failure rate at the component level. It obviously leads to the topic of purity and control in the CMP & WEC area.

Our specialists will present products and solutions that contribute to reduce operating costs, maximize efficiency and improve the value of your CMP & WEC operations - see program below. Take this opportunity to meet Entegris’ technologists, and exchange on your challenges. We will end-up the day with a friendly and informal 'after work' party, you are all welcome!

>> Please register to the session of your choice thru the RSVP link by latest June, 21st.

AGENDA

Chemical Mechanical Planarization Session

08:30 Registration & Welcome

09:00 Introduction

  • Entegris company overview
  • CMP challenges

09:20 Increasing CoO with PlanarClean® Advanced Post-CMP Cleaning Solutions

  • Post-CMP cleans technical roadmap
  • Entegris PCMP cleans key benefits
  • BEOL & FEOL technology update

09:55 Measuring and Controlling CMP Critical Chemistry

  • Flow metering and control for bulk and process chemicals
  • Monitoring real time chemical concentrations

10:30 Networking Refreshment Break

10:50 Optimizing Filtration of CMP Slurries for Performance and Cost of Ownership

  • Full contamination control solution from bulk distribution to slurry dispense points
  • Nanofiber technology media vs traditional media

11:25 Continuous Slurry Monitoring to Detect Agglomeration and Prevent Scratching

  • Why monitor LPC’s?
  • Overview of Entegris online CMP monitoring solutions
  • Examples of how Entegris Particle Sizing Solutions can be used to improve the CMP process

12:15 Networking Lunch sponsored by Entegris

Wet Etch & Clean Session

13:45 Introduction

  • Entegris company overview
  • WEC challenges

14:05 Real Time Measurement and Control of Critical Chemistry

  • Flow metering and control of bulk and process chemicals
  • Refractive index technology to enable chemical mixing and dispense process excursion control

14:40 Controlling Contamination To Manage Latent & Killer Defects

  • Particles and ions affect device reliability and yield
  • Filtration to support defectivity management
  • Most adequate solutions

15:15 Networking Refreshment Break

15:35
Fluid Management to Address Critical Contamination and Safety Risks

  • High purity PFA tube to transport chemicals
  • Avoiding electro-static build-up in PFA tube
  • Safe and reliable connections for leak-free performance

16:10 Application Expertise to Support Your Defect Management Strategy

  • Entegris capabilities
  • Real case examples
  • Towards a new collaboration

17:00 'After work' sponsored by Entegris
 
 

Veranstaltungsort
GebäudeEnsemble Deutsche Werkstätten Hellerau

Moritzburger Weg 67
01109 Dresden

GebäudeEnsemble Deutsche Werkstätten Hellerau

Ansprechpartner

Francoise Moign
Entegris
Tlefon: +33 (0)4 76 35 73 17
Telefon geschäftlich: +33 (0)6 21 12 05 59
Francoise.Moign@entegris.com

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