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36th European Mask and Lithography Conference | EMLC 2021

In 2021, the EMLC will have a new look - as a one-day online event!

The one certainty in today’s tumultuous world is that the effects of COVID-19 will continue to challenge all aspects of our business and drive flexibility and innovative solutions in our technology, communication, logistics, and planning. In 2020, we saw the cancellation of Photomask Japan (PMJ) in April, the postponement of the European Mask and Lithography Conference (EMLC) in June, and conversion of the September Photomask and EUV Lithography conference (BACUS/PUV) to an online forum.

As we move into 2021, the impact of COVID-19 on this year’s photomask conferences continues to be predictable only in its unpredictability. Currently, all three major Photomask conferences will be held, but each has adapted differently to the health and travel restrictions.

Due to all these circumstances the 2021 European Mask and Lithography Conference (EMLC2021) requires conversion to an online format. The EMLC Program Committee decided that this year’s EMLC will feature a novel panel-centric online event. The EMLC – Online Event 2021 with Live Panel Sessions and live Q&A is scheduled on Tuesday June 22nd 2021.

In the online version of the EMLC 2021, the conference will be split into two time slots.
First slot from 06:30 AM to 09:15 AM German time (CEST = central European summer time) and the second slot from 02:30 PM to 05:30 PM CEST). This would allow live presentations with attendances from America, the Asian Hemisphere and Europe.

The planned four Panel Sessions are covering:

  • PANEL 1) EUV Lithography
  • PANEL 2) EUV Mask Topics
  • PANEL 3) Manufacturing Data Analytics
  • PANEL 4) Career opportunities for young scientists and engineers in semiconductor lithography and mask Industry

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