Vistec Electron Beam GmbH
- Semiconductor Industry
- Supplier: Equipment
- Electron-beam lithography
As a long-standing equipment supplier, Vistec Electron Beam GmbH, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as electron-beam direct write in semiconductor manufacturing, mask making as well as integrated optics and several new emerging markets.
Vistec Electron Beam´s roots go back to the 1950´s when the company was part of Carl Zeiss Jena where the first electron microscope was developed. In 1974, the first commercial shaped beam system was launched on the basis of fundamental patents.
In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Europe, Taiwan and in the US.