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Fraunhofer-Institut für Photonische Mikrosysteme IPMS

Fraunhofer-Institut für Photonische Mikrosysteme IPMS

Fraunhofer-Institut für Photonische Mikrosysteme IPMS

Business Segments:
  • Communication
  • Semiconductor Industry
  • Medical Technology / Pharma
  • Computers
  • Automotive
  • Electronic
Core Competences:
  • Research / Education: Research Institutes
Specialisation:
  • Foundry Services
  • MEMS
  • Sensors
  • ASIC Design
  • Light Modulators / Scanners
  • Development partner

Spatial Light Modulator for Laser Direct Imaging
Spatial Light Modulator for Laser Direct Imaging
The Fraunhofer IPMS with its 290 employees is dedicated to applied research and development at the highest international level in the fields of photonic microsystems, microsystems technologies, nanoelectronic technologies and wireless microsystems. Innovative processes and products which are based upon our various technologies can be found in all large markets – such as information and communication technologies, consumer products, automobile technology, semi-conductor technology, measurement and medical technology. Direct commissions from industry contribute 50 percent to the annual research budget of 33 million euros.

Quasi static linear scanning mirror
Quasi static linear scanning mirror
Regarding micromechanical and photonic microsystems we offer complete solutions: From conception to component right up to complete systems. This includes sample and pilot production in our 1500 m² (15,000 ft²) clean room (ISO 14644-1 class 4) with qualified processes. In order to meet the challenging demands of our customers, our institute is certified according to the standard DIN EN 9001:2008 for research, development and fabrication including semiconductor and microsystem processes as well as integrated actuators and sensor technologies.

300mm test wafer
300mm test wafer
Additionally, our business unit Center Nanoelectronic Technologies CNT provides services in the field of nano and micro electronics with functional electronic materials, processes and systems, device and integration, maskless lithography and analytics. Another 800 m² of clean room space (ISO 14644-1 class 6) is available for this purpose, along with analysis and metrology processes with atomic resolution and high sensitivity.

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