Novel High k Application Workshop 2017 in Dresden
NaMLab invites to the Novel High-k Application Workshop on March 9th and 10th, 2017.
New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 80 participants from industry, research institutes and universities.
In this series of annual workshops NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. The ferroelectric properties of doped HfO2 and ZrO2 were discovered 10 years ago.
On the second day of the workshop, root causes for the formation of this so far unknown phase will be discussed.
More information including the link to registration can be found here.
Based on key expertise in dielectric materials for semiconductor devices NaMLab focuses on the integration and application of its materials expertise applied to reconfigurable and energy efficiency devices. www.namlab.de